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Test of Opticlean strip coating material for removing surface contamination
Physics Division, Michelson Laboratory, Naval Air Warfare Center, China Lake, CA, United States.
Acreo AB, Kista, Sweden.ORCID-id: 0000-0003-2887-049X
2000 (Engelska)Ingår i: Applied Optics, ISSN 0003-6935, E-ISSN 1539-4522, Vol. 39, nr 16, s. 2737-2739Artikel i tidskrift (Refereegranskat) Published
Abstract [en]

The strip coating material, Opticlean, which has been reformulated, has been shown to remove 1-5-mu m-diameter particles as well as contamination remaining from previous drag wipe cleaning on a used silicon wafer. In addition, no residue that produced scattering was found on a fresh silicon wafer when Opticlean was applied and then stripped off. The total integrated scattering technique used for the measurements could measure scattering levels of He-Ne laser light as low as a few ppm (parts in 106), corresponding to a surface roughness of <1 Angstrom rms.

Ort, förlag, år, upplaga, sidor
2000. Vol. 39, nr 16, s. 2737-2739
Nyckelord [en]
Strip coating materials, Contamination; Silicon wafers; Surface chemistry; Surface roughness, Materials science
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Fysik
Identifikatorer
URN: urn:nbn:se:hig:diva-23219DOI: 10.1364/AO.39.002737ISI: 000087311100030Scopus ID: 2-s2.0-0038492446OAI: oai:DiVA.org:hig-23219DiVA, id: diva2:1062367
Tillgänglig från: 2017-01-05 Skapad: 2017-01-05 Senast uppdaterad: 2018-03-13Bibliografiskt granskad

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