Surface roughness of oxidised copper films studied by atomic force microscopy and spectroscopic light scattering
1998 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 325, no 1-2, 92-98 p.Article in journal (Refereed) Published
The interface roughness of Cu2O films produced by thermal oxidation of Cu was studied by spectroscopic elastic light scattering and atomic force microscopy. No correlation could be found between the roughness of the two interfaces, although the amplitude and the length scale of the roughness changed in the same way with film thickness for both interfaces. Both interfaces were found to have a fractal dimension of two. A first order perturbation theory was used to analyse the light scattering data; theory and experiment are in good agreement within the limits of the theory.
Place, publisher, year, edition, pages
1998. Vol. 325, no 1-2, 92-98 p.
Atomic force microscopy; Copper oxides; Interfaces (materials); Light scattering; Perturbation techniques; Surface roughness; Thermooxidation, Spectroscopic elastic light scattering, Metallic films
Physical Sciences Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:hig:diva-23228DOI: 10.1016/S0040-6090(98)00503-3ISI: 000075107000016ScopusID: 2-s2.0-0032119690OAI: oai:DiVA.org:hig-23228DiVA: diva2:1062878