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Surface roughness of oxidised copper films studied by atomic force microscopy and spectroscopic light scattering
Max Planck Institut für Festkörperforschung, Stuttgart, Germany.ORCID iD: 0000-0003-2887-049X
Department of Materials Science, Uppsala University, Uppsala, Sweden.
Department of Materials Science, Uppsala University, Uppsala, Sweden.
Department of Materials Science, Uppsala University, Uppsala, Sweden.
1998 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 325, no 1-2, 92-98 p.Article in journal (Refereed) Published
Abstract [en]

The interface roughness of Cu2O films produced by thermal oxidation of Cu was studied by spectroscopic elastic light scattering and atomic force microscopy. No correlation could be found between the roughness of the two interfaces, although the amplitude and the length scale of the roughness changed in the same way with film thickness for both interfaces. Both interfaces were found to have a fractal dimension of two. A first order perturbation theory was used to analyse the light scattering data; theory and experiment are in good agreement within the limits of the theory.

Place, publisher, year, edition, pages
1998. Vol. 325, no 1-2, 92-98 p.
Keyword [en]
Atomic force microscopy; Copper oxides; Interfaces (materials); Light scattering; Perturbation techniques; Surface roughness; Thermooxidation, Spectroscopic elastic light scattering, Metallic films
National Category
Physical Sciences Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:hig:diva-23228DOI: 10.1016/S0040-6090(98)00503-3ISI: 000075107000016ScopusID: 2-s2.0-0032119690OAI: oai:DiVA.org:hig-23228DiVA: diva2:1062878
Available from: 2017-01-09 Created: 2017-01-05 Last updated: 2017-01-09Bibliographically approved

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CiteExportLink to record
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Citation style
  • apa
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