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Spectroscopic Light Scattering from Electrochromic Tungsten-oxide-based Films
Department of Technology, Uppsala University, Uppsala, Sweden.ORCID iD: 0000-0003-2887-049X
Department of Technology, Uppsala University, Uppsala, Sweden.
Department of Technology, Uppsala University, Uppsala, Sweden.
1996 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 80, no 1, 423-430 p.Article in journal (Refereed) Published
Abstract [en]

Films of W oxide and oxyfluoride were made by reactive sputtering, and electrochromic absorption modulation was obtained by subsequent electrochemical Li intercalation. Total and diffuse transmittance and reflectance were measured in the 0.4-1 μm wavelength range using a newly developed instrument. The ratio between diffuse and total optical response was <0.2% for the transmittance and <1% for the reflectance irrespective of the electrochromic absorption level. These magnitudes of the scattering are acceptable for practical smart windows applications and lend credence to a description of electrochromism in terms of localized absorption centers. Vector perturbation theory for light scattering by a film with rough interfaces could be reconciled with the data, assuming uncorrelated roughness.

Place, publisher, year, edition, pages
1996. Vol. 80, no 1, 423-430 p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering Physical Sciences
Identifiers
URN: urn:nbn:se:hig:diva-23250ISI: A1996UU53200066Scopus ID: 2-s2.0-0007607839OAI: oai:DiVA.org:hig-23250DiVA: diva2:1062898
Available from: 2008-10-17 Created: 2017-01-05 Last updated: 2017-01-09Bibliographically approved

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