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Surface Roughness of Sputtered ZrO2 Films Studied by Atomic Force Microscopy and Spectroscopic Light Scattering
Department of technology, Uppsala university, Uppsala, Sweden.ORCID iD: 0000-0003-2887-049X
Department of technology, Uppsala university, Uppsala, Sweden.
Department of technology, Uppsala university, Uppsala, Sweden.
1996 (English)In: Physical Review E. Statistical, Nonlinear, and Soft Matter Physics: Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics, ISSN 1063-651X, E-ISSN 1095-3787, Vol. 54, no 4 Suppl. B, 4021-4026 p.Article in journal (Refereed) Published
Abstract [en]

ZrO2 films were prepared by reactive sputtering. Elastic light scattering was used to determine the cross correlation of the substrate and film interface roughness. Surface profiles were measured with atomic-force microscopy. The power spectral density functions could be fitted by the K-correlation model, suggesting self-affine fractal surfaces. The roughness of the film front surfaces was of the same order of magnitude as the substrate roughness. We have derived a replication factor from experimental data that gives information on the evolution of the contribution of the substrate roughness.

Place, publisher, year, edition, pages
1996. Vol. 54, no 4 Suppl. B, 4021-4026 p.
National Category
Physical Sciences Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:hig:diva-23249DOI: 10.1103/PhysRevE.54.4021ISI: A1996VN17700021Scopus ID: 2-s2.0-0007960467OAI: oai:DiVA.org:hig-23249DiVA: diva2:1062901
Available from: 2008-10-17 Created: 2017-01-05 Last updated: 2017-01-09Bibliographically approved

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Rönnow, Daniel
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Physical Review E. Statistical, Nonlinear, and Soft Matter Physics: Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
Physical SciencesElectrical Engineering, Electronic Engineering, Information Engineering

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