hig.sePublications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard-cite-them-right
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • sv-SE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • de-DE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Surface roughness of pyrolytic tin dioxide films evaluated by different methods
Department of Materials Science, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
Department of Materials Science, The Ångström Laboratory, Uppsala University, Uppsala, Sweden; Institute of Optical Research, Electrum, Kista, Sweden.ORCID iD: 0000-0003-2887-049x
Department of Materials Science, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.ORCID iD: 0000-0002-5496-9664
Department of Materials Science, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.
Show others and affiliations
2000 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 359, no 2, p. 203-209Article in journal (Refereed) Published
Abstract [en]

The scaling of surface roughness in thin spray pyrolyzed fluorinated tin dioxide films of different thicknesses was obtained from atomic force microscopy. The data show that, within experimental uncertainties, the effective dimensionality of the surface is 2; hence no evidence of fractal surface roughness was found. Other methods – based upon light scattering and cyclic voltammetry – gave additional information on the surface topography. Cyclic voltammetry measurements show that the reaction sites on the surface are distributed in a fractal structure and may be identified with hillocks seen in surface reliefs.

Place, publisher, year, edition, pages
2000. Vol. 359, no 2, p. 203-209
Keywords [en]
Surface roughness; Tin dioxide; Atomic force microscopy; Electrochemistry
National Category
Nano Technology
Research subject
Engineering Science with specialization in Nanotechnology and Functional Materials
Identifiers
URN: urn:nbn:se:hig:diva-23245DOI: 10.1016/S0040-6090(99)00743-9ISI: 000084847700015Scopus ID: 2-s2.0-18544397770OAI: oai:DiVA.org:hig-23245DiVA, id: diva2:1062933
Available from: 2015-08-09 Created: 2017-01-05 Last updated: 2022-09-19Bibliographically approved

Open Access in DiVA

No full text in DiVA

Other links

Publisher's full textScopus

Authority records

Rönnow, DanielStrömme, Maria

Search in DiVA

By author/editor
Rönnow, DanielStrömme, Maria
In the same journal
Thin Solid Films
Nano Technology

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 366 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard-cite-them-right
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • sv-SE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • de-DE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf