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Elastic Light Scattering and Electrochemical Durability of Electrochromic Tungsten-oxide-based Films
Department of Technology, Uppsala University, Uppsala, Sweden.
Department of Technology, Uppsala University, Uppsala, Sweden.ORCID iD: 0000-0003-2887-049X
Department of Technology, Uppsala University, Uppsala, Sweden.
1996 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 288, no 1-2, 330-333 p.Article in journal (Refereed) Published
Abstract [en]

Electrochromic W-oxide-based films were produced by reactive d.c. magnetron sputtering. Fluorination and substrate bias were used to modify the film properties. Spectral measurements of the total and diffuse light scattering showed that the diffuse component remained at much less than 1% in the visible, irrespective of electrochemical degradation, which is low enough for smart windows applications.

Place, publisher, year, edition, pages
1996. Vol. 288, no 1-2, 330-333 p.
Keyword [en]
Electrochemistry; Optical properties; Sputtering; Tungsten oxide
National Category
Electrical Engineering, Electronic Engineering, Information Engineering Physical Sciences
Identifiers
URN: urn:nbn:se:hig:diva-23242DOI: 10.1016/S0040-6090(96)08809-8ISI: A1996VZ20500061Scopus ID: 2-s2.0-0030288770OAI: oai:DiVA.org:hig-23242DiVA: diva2:1062947
Available from: 2008-10-17 Created: 2017-01-05 Last updated: 2017-01-09Bibliographically approved

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