Determination of interface roughness by using a spectroscopic total-integrated-scatter instrument
1993 (English)In: Applied Optics, ISSN 1559-128X, E-ISSN 2155-3165, Vol. 32, no 19, 3448-3451 p.Article in journal (Refereed) Published
A spectroscopic total-integrated-scatter instrument has been constructed. It uses a Coblentz sphere for the collection of the scattered light and a lamp with a monochromator as a light source. It can be used to measure diffuse reflectance as well as transmittance. The instrument has been used to measure diffuse reflectance of thermally and chemical-vapor-deposition oxidized silicon wafers. Comparisons are made with measurements by using a spectrophotometer with an integrating sphere. The data have been interpreted with a parameterized model for light scattering from a double layer, to obtain rms surface roughness values for the two interfaces of the oxide film.
Place, publisher, year, edition, pages
1993. Vol. 32, no 19, 3448-3451 p.
Instruments; Light scattering; Light sources; Oxide films; Reflection; Silicon oxides; Spheres; Surface roughness; Vapors; Chemical vapor deposition; Optics; Spectroscopy, Diffuse reflectance; Double layers; Integrating spheres; Interface roughness; Oxidized silicon wafers; Parameterized model; Scattered light, Interfaces (materials); Roughness measurement, Chemical-vapor deposition oxidized silicon wafers; Interface roughness determination; Optical double layer; Spectroscopic total-integrated scatter instrument
Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:hig:diva-23235DOI: 10.1364/AO.32.003448ISI: A1993LK40500014ScopusID: 2-s2.0-0027639031OAI: oai:DiVA.org:hig-23235DiVA: diva2:1062982