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  • 1.
    Lindström, T.
    et al.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Kullman, L.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Rönnow, Daniel
    Max-Planck-Institut für Festkörperforschung, Stuttgart ,Germany.
    Ribbing, C. G.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Granqvist, C. G.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Electrochromic control of thin film light scattering1997In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 81, no 3, p. 1464-69Article in journal (Refereed)
    Abstract [en]

    Total and diffuse reflectance spectra were measured on Al surfaces covered with electrochromic W oxide films in colored and bleached states. Vector perturbation theory was used for analyzing the spectra. The diffuse reflectance appeared to originate from correlated (uncorrelated) interface roughness when the W oxide film was fully colored (bleached). Assuming partially correlated interfaces led to agreement between experimental and calculated spectra. The use of an electrochromic film appears a promising method to control the relative contributions of the interfaces to the resulting scattering.

  • 2.
    Rönnow, Daniel
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Determination of interface roughness cross correlation of thin films from spectroscopic light scattering measurements1997In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 81, no 8, p. 3627-3636Article in journal (Refereed)
    Abstract [en]

    Diffuse reflectance and transmittance spectra collected in different scattering angle intervals have been analyzed in order to determine the interface roughness cross correlation of thin films. Different angle intervals correspond to different roughness length scales; the cross correlation as a function of length scale can hence be determined. Sputter deposited ZrO2 films were analyzed. The transition from correlated to uncorrelated film interfaces was found to occur at longer length scales, when the film thickness increased.

  • 3.
    Rönnow, Daniel
    et al.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Kullman, L.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Granqvist, C. G.
    Department of Technology, Uppsala University, Uppsala, Sweden.
    Spectroscopic Light Scattering from Electrochromic Tungsten-oxide-based Films1996In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 80, no 1, p. 423-430Article in journal (Refereed)
    Abstract [en]

    Films of W oxide and oxyfluoride were made by reactive sputtering, and electrochromic absorption modulation was obtained by subsequent electrochemical Li intercalation. Total and diffuse transmittance and reflectance were measured in the 0.4-1 μm wavelength range using a newly developed instrument. The ratio between diffuse and total optical response was <0.2% for the transmittance and <1% for the reflectance irrespective of the electrochromic absorption level. These magnitudes of the scattering are acceptable for practical smart windows applications and lend credence to a description of electrochromism in terms of localized absorption centers. Vector perturbation theory for light scattering by a film with rough interfaces could be reconciled with the data, assuming uncorrelated roughness.

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